Оборудование

  • Centaur U HR – Scanning AFM/Confocal/Raman/Fluorescence system with double dispersion monochromator for Raman/Fluorescence and AFM/Raman (TERS) imaging

    Centaur U HR – Scanning AFM/Confocal/Raman/Fluorescence system with double dispersion monochromator for Raman/Fluorescence and AFM/Raman (TERS) imaging

     

    Centaur HR (High resolution) includes high-aperture double dispersive monochromator/spectrograph whose compact design combines high spectral resolution intrinsic for long-focus devices and extremely low stray light peculiar to double schemes.

  • Nanotechnological complex nanofab 100

    Nanotechnological complex nanofab 100

     

    Nanotechnology complexes (NTC) Nanofab 100 have modular design and can be used both for  research purposes in various fields of  nanotechnology (microelectronics and nanoelectronics, Nano photonics, Nano materials and etc. ) and for low-batch production of nanostructure, nanoelements and nanodevices.

  • Device of carbon nanotube growth “CVDomna”

    Device of carbon nanotube growth “CVDomna”

     

    CVDomna can be used both in research work and in the educational process for the growth of carbon nanotubes. Using the technology of chemical vapor deposition from the gas phase in the CVDomna produces carbon nanotubes in the form of soot material and comprising the micro-structures and nanodevices (CNT electrodes, CNT-FET).

  • Multipurpose x-ray complex "RIKOR-8"

    Multipurpose x-ray complex "RIKOR-8"

     

    “RIKOR-8” is designed for the phase, structural, elemental analysis of crystalline, polycrystalline and amorphous samples. The unique feature of the device is the combination of the x-ray diffractometer and x-ray fluorescence spectrometer capabilities in one device.

  • Laboratory complex for nanoelectronics elements development on the basis of local anodic oxidation

    Laboratory complex for nanoelectronics elements development on the basis of local anodic oxidation

     

    Laboratory complex is based on universal scanning probe microscope Solver-Pro (AFM, STM, samples diameter up to 100 mm). Equipped with a humidity control system, means of static electrical characteristics in-situ measurements. 

  • Sputter coater Emitech K575X

    Sputter coater Emitech K575X

     

    Sputtering of ultra-thin films Au, Ag, Pd, Pt, Cr, Ti, Ta, Ni, etc. on the substrate up to 100 mm (4 inches) in diameter

  • Specific surface area analyser: Sorbtometer–M

    Specific surface area analyser: Sorbtometer–M

     

    The main procedure of analyser is based on the method of the adsorbate (nitrogen) thermal desorption in dynamic conditions. In this method, the fixed stream of helium-nitrogen (or other gas mixture) with adjusted structure passes through the adsorber with the sample.

    Thus, the main area - is the study of porous nanostructures.