Nanotechnological complex nanofab 100
Nanotechnology complexes (NTC) of Nanofab 100 have modular construction and can be used both for research objects in various fields of nanotechnology (micro- and nano-sized electronics, nano-sized photonics, nanophase materials science ) and for low-batch production of nanostructure, nanoelements and nanodevices.
NC Nanofab consists of 3 basic modules which are united by transportational evacuated system which makes it possible to transport the wafers with diameter up to 100mm (4 inches) between modules :
· Molecular beam epitaxy (MBE) module for forming heterojunction structures based on GaN/AlGaN of heterojunction structures;
· Focused ion beam( FIB )and scanning electron microscopy(SEM) ;
· The module of high-vacuum atomic force microscopy(AFM)
The module also includes : a section of heatup of wafers, a section of high temperature evacuated annealing, a section of and a batching up and a section of change of AFM probes
Basic parameters of nitride module MBE (manufactured by SemiTeech)
The capability of rotation of delivery vehicle of the template |
not less than 1 rpm/sec |
The highest possible temperature of heating of template |
not less than 1100°C |
The temperature control of substrate heater |
W/Re thermocouple with precision ±0,5°C |
On-line analyzer of residual atmosphere |
Quadrupolar type |
Ports for laser interferometer and pyrometer |
With dampers |
The system of march suction with turbomolecular pump |
with a productivity rate 1400-2000 l/sec |
Highest attainable vacuum after heat addition (for 48 hours ,200 C°) |
Not worse than 1x10-8 Pa |
Basic parameters of ultrahigh-vacuum module FIB(manufactured by Orsay Physics).
Sample |
Size |
From 10 to 100 mm in diameter ,to 8mm in height |
Weight |
To 150 g |
|
FIB system |
|
|
The size of spot |
≤10nm if PO=12mm |
|
Operational field |
300x300 μm |
|
Flange back distance |
From 12 to 27 mm |
|
beam energy |
3-30 keV |
|
ion current |
From 1 pA to 20 nA |
|
Time of cut-off of current |
≤100ns |
|
intensity of current |
20 A/cm2 |
|
Time of life of gallic source |
Not less than 1500 |
|
Coordinate table |
|
|
XY positioning of sample |
100x100 mm |
|
Speed of moving of coordinate table |
≤250 mm/s |
|
Distinguishability of repositioning |
Less than 1 μm (pak-to-peak) |
|
Vacuum |
≤1.2x10-8 Pa |
|
Capability of heatup of the system |
to 150 °C |
|
Vibrating insulation |
Active |
1-200 Hz |
Passive |
Over 200 Hz |